Characterization of the Magnetic-Field Parameters of an Electron Cyclotron Resonance Plasma System
نویسنده
چکیده
Semiconductor Research Corporation under contract no 2008-KJ-1871 Abstract—The magnetic field in an electron cyclotron resonance plasma processing system was characterized using IEEE standard measurement practices. We discuss methods for a low-cost Hall-effect sensor array construction, calibration, and measurement collection to meet or exceed available standards. Utilizing standard measurement practices, we find measured magnetic field parameters to be in excellent agreement with theoretical calculations.
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تاریخ انتشار 2012